°øÁ¤±â¼ú | Àç·á, Àü±â/ÀüÀÚ, ±â°è, ¹°¸®, ÈÇÐ, ±Ý¼Ó, ¹ÝµµÃ¼ | - Wafer °øÁ¤/Àåºñ À¯Áö°ü¸® ¹× °³¼±
- Wafer ǰÁú ¹× ¼öÀ² °³¼±À» À§ÇÑ °øÁ¤°ü¸®
- ½Å±Ô Àåºñ °³¹ß ¹× Set-up
- Growing(´Ü°áÁ¤ ¼ºÀå) °øÁ¤
- Shaping(Àý»è/¿¬»è/¿¬¸¶) °øÁ¤
- Polishing(¿¬¸¶) °øÁ¤
- Cleaning(¼¼Á¤/½Ä°¢) °øÁ¤
- EPI(ÁõÂø/CVD) °øÁ¤
| ±¸¹Ì/ûÁÖ |
Àåºñ±â¼ú | Àü±â/ÀüÀÚ, ±â°è, ¸ÞīƮ·Î´Ð½º | - Wafer °øÁ¤ Àåºñ À¯Áö/º¸¼ö ¹× ¼º´É °³¼±
- Wafer ±¹»êÈ Àåºñ °³¹ß ¾÷¹« ¹× Áõ¼³ Àåºñ °Ë¼ö/Set-up
- Growing(´Ü°áÁ¤ ¼ºÀå) °øÁ¤
- Shaping(Àý»è/¿¬»è/¿¬¸¶) °øÁ¤
- Polishing(¿¬¸¶) °øÁ¤
- Cleaning(¼¼Á¤/½Ä°¢) °øÁ¤
| ±¸¹Ì |